Plasma Etching

Introduction of High Selectivity Etching in Chip Manufacturing

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Introduction of High Selectivity Etching in Chip Manufacturing

Click the blue textto follow us Through high selectivity etching, specialized etching tools remove or etch materials from the microchip structures during the IC production process. Furthermore, these high selectivity etching tools can remove materials in any direction (isotropic) without damaging other parts of the device. In some cases, high selectivity etching tools can also … Read more

Introduction to Semiconductor Manufacturing Technology 57 – Plasma Dry Etching Process

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Introduction to Semiconductor Manufacturing Technology 57 - Plasma Dry Etching Process

Dry Etching: Using gaseous chemical etchants to react with materials to form volatile by-products that can be removed from the substrate, achieving the purpose of etching. Role of Plasma: Generates free radicals, enhancing the rate of chemical reactions; Simultaneously possesses ion bombardment capability, which can physically remove materials from the surface and break chemical bonds … Read more