Introduction to Semiconductor Manufacturing Technology 57 – Plasma Dry Etching Process
Dry Etching: Using gaseous chemical etchants to react with materials to form volatile by-products that can be removed from the substrate, achieving the purpose of etching. Role of Plasma: Generates free radicals, enhancing the rate of chemical reactions; Simultaneously possesses ion bombardment capability, which can physically remove materials from the surface and break chemical bonds … Read more
