Ion Beam Etching Machine 20 IBE-C
Shanghai Bordon Japan Imported NS Ion Beam Etching Machine 20 IBE-C, Suitable for medium-scale laboratory research, Capable of etching materials of 3 inches, 4 inches, 6 inches, 8 inches wafers. Utilizes self-developed rotary and planetary transfer mechanism “Dry Chuck Planet”, ensuring a relatively uniform and smooth surface for samples. Etching uniformity ≤±5%. The Ion Beam … Read more