dry etching

Ion Beam Etching Machine 20 IBE-C

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Ion Beam Etching Machine 20 IBE-C

Shanghai Bordon Japan Imported NS Ion Beam Etching Machine 20 IBE-C, Suitable for medium-scale laboratory research, Capable of etching materials of 3 inches, 4 inches, 6 inches, 8 inches wafers. Utilizes self-developed rotary and planetary transfer mechanism “Dry Chuck Planet”, ensuring a relatively uniform and smooth surface for samples. Etching uniformity ≤±5%. The Ion Beam … Read more

Etching Process in Semiconductor Technology

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Etching Process in Semiconductor Technology

Yangzhou Lattice Semiconductor specializes in providing high-purity, large-size single crystal silicon & polycrystalline silicon materials, and can perform deep processing customization such as cutting, grinding, polishing, and drilling, including silicon wafers, silicon components, silicon target materials, silicon seed crystals, silicon electrodes, silicon rings, silicon window pieces, and other silicon products. The etching technique is a … Read more