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The Key Role of Plasma in Semiconductor Manufacturing
In previous articles, we have detailed the introduction of plasma: Plasma Introduction | Da Semi Learning Notes
Due to its unique physicochemical properties, plasma is widely used in critical processes such as thin film deposition, etching, ion implantation, cleaning, and bonding. Additionally, plasma technology plays an important role in fields such as photovoltaic thin film deposition, display panel coating, and precision optical coating.
This time we introduce:Plasma RF Power Supply Systems.
Overview of Plasma RF Power Supply Systems
System Composition and Basic Principles
The plasma RF power supply system is a core specialized power supply system in semiconductor manufacturing.It mainly consists of two parts: the plasma RF power supply and the matching network.
RF Power Supply: AE (Image Source)
Matching Network: Yingjie Electric RMA Series (Image Source)
RF Power Supply is a process power supply capable of generating sine wave voltage with a working frequency range typically from 3KHz to 300GHz, featuring specific power output capabilities. In semiconductor manufacturing, the operating frequency of RF power supplies mainly concentrates between 2MHz and 60MHz.
Core Technical Functions — Generating High-Frequency Electric Fields
The core function of this system is to generate high-frequency electric fields to ionize specific process gases within the wafer reaction chamber, creating and maintaining a highly active and high-energy plasma environment. Utilizing the special properties of plasma enables complex semiconductor processes such as thin film deposition, etching, and ion implantation. Among these, thin film deposition, etching, and photolithography are known as the three key processes in chip manufacturing.
Impact of RF Power Supply Performance
The performance of the plasma RF power supply system directly determines the concentration, uniformity, and stability of plasma in processes such as thin film deposition and etching.
These parameters have a decisive impact on the thickness, density, stress, deposition rate of the film, as well as the selectivity, directionality, rate, and quality of etching, which in turn relates to the overall wafer manufacturing process capability, yield, and efficiency.
For this reason, the plasma RF power supply system occupies a core position in semiconductor manufacturing equipment.
Technical Classification and Development Trends of RF Power Supplies
Based on the type of power amplifier used, RF power supplies can be classified into tube RF power supplies and transistor RF power supplies (also known as all-solid-state RF power supplies).
With technological advancements, all-solid-state RF power supplies are gradually becoming the market mainstream due to their higher reliability and stability.
Specific Applications in Semiconductor Equipment
1. Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Working Principle: In a low-pressure environment, low-temperature plasma generated by the RF power supply produces glow discharge on the cathode of the process chamber, raising the wafer to the predetermined temperature. After introducing process gases, they decompose into electrons, ions, and active groups under the influence of the RF electric field, ultimately forming a solid film on the wafer surface.
2. Plasma Etching
Working Principle: After introducing etching gases into the reaction chamber, they are ionized by the high-frequency electric field generated by the RF power supply to form plasma, enhancing the reactivity of the gases.
3. Ion Implantation
Working Principle: In a high vacuum environment, the RF ion source activates gas molecules in a magnetic field, producing positively charged impurity ions. The ions are accelerated and implanted into the silicon lattice structure.
Market Size and Growth Prospects of RF Power Supplies
Global Market
According to Frost & Sullivan statistics, the global plasma RF power supply system market size reached $4.99 billion in 2023, with a compound annual growth rate of 12.2% over the past five years. It is expected that the compound annual growth rate will maintain a growth rate of 9.4% from 2024 to 2028, indicating an accelerating growth trend.
Chinese Market
In 2023, the market size of plasma RF power supply systems in mainland China reached 11.26 billion yuan, with a compound growth rate of 16.9% over the past five years. Among these, the semiconductor sector is the largest, reaching 5.84 billion yuan; the photovoltaic and display panel sectors each account for about 1.1 billion yuan. It is expected that the compound annual growth rate will be 11.2% from 2024 to 2028, showing strong growth momentum.
Segment Market Size
The market size of the Chinese semiconductor RF power supply industry is expected to grow from 652 million yuan in 2022 to 855 million yuan in 2024, with a compound annual growth rate of 14.48%. It is expected that by 2026, the market size will grow to 1.098 billion yuan.
Global RF Power Supply Market and Major Manufacturers
Current International Monopoly Situation: Currently, the global market is mainly dominated by two giants, MKS and AE from the USA, with the remaining share occupied by Japanese and German companies, resulting in a very low domestic production rate. In 2023, the domestic production rate of plasma RF power supply systems in the semiconductor field in mainland China was less than 7%, making it one of the most severely “choked” segments.
Data Source: Semiconductor Research Review
Introduction to Major International Manufacturers:
MKS (USA):
A global leader in plasma RF power supply systems, with products covering multiple stages of the semiconductor manufacturing process chain. The revenue for 2024 is projected to be $3.586 billion.
AE (Advanced Energy Industries, Inc) (USA):
Provides precision power, sensing, and control solutions across multiple fields, leading the global market share in plasma RF power supplies for several consecutive years.
Hüttinger (Germany):
A subsidiary of the Trumpf Group, focusing on the development of DC/DC pulse power supplies and plasma RF power supplies.
DAIHEN (Japan):
Has advantages in industrial automation, robotics, and transformers, while also producing plasma RF power supply products.
Introduction to Domestic Representative Enterprises:
Yingjie Electric:
A professional industrial power design and manufacturing enterprise, with RF power supplies starting mass production in the fourth quarter of 2023, and receiving investment from Zhongwei Company.
Huacheng Electronics:
A wholly-owned subsidiary of Northern Huachuang, integrating RF application technology resources to create an integrated circuit equipment component industry platform.
Hengyun Chang:
A leading domestic RF power supply enterprise that has broken the overseas monopoly and entered the IC front-end equipment supply chain. Projected revenue for 2024 is 540 million yuan, with a net profit of 140 million yuan.
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