Advancements in GaN Technology II: The First 100nm High-Performance GaN Wafer PDK Platform in China
Jiufengshan Laboratory GaN PDK R&D Team Jiufengshan Laboratory GaN Series Achievements II Recently, Jiufengshan Laboratory released the first 100 nm silicon-based GaN commercial Process Design Kit (PDK) in China, with performance indicators reaching domestic leading and international top levels. As the second commercial solution globally and the first in China, its technical specifications support high-throughput … Read more